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02/28/2020 Interview > Faculty > 우수연구자

Title

[HY's Excellence] A Pioneer in the Field of Semiconductor Wet Cleaning and CMP, Leading Global Technology in the Korean Semiconductor Industry

Professor Jin-Goo Park (Department of Materials Science and Chemical Engineering)

한양뉴스포털

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http://www.hanyang.ac.kr/surl/PqJJB

Contents

Hydrofluoric acid, which was included in Japan’s trade regulation in 2019, is a well-known semiconductor-cleaning solution. Who is the leading researcher that studies ultra-high purity and high-performance semiconductor wet cleaning solutions? This individual is Professor Jin-Goo Park from the Department of Materials Science and Chemical Engineering at Hanyang University. Professor Park started his career by working at Texas Instruments, a US semiconductor company, as a wet cleaning and surface chemistry researcher after obtaining his Ph. D. from the University of Arizona. He joined Hanyang University in 1994, and he has been conducting research in the field of wafer wet cleaning and surface modification. Since CMP as a polishing process began to be applied to semiconductors at the end of the 1990s, Professor Park also had started to conduct research on CMP since the background foundations of cleaning and CMP are the same.

Semiconductor cleaning and CMP studies are interdisciplinary company-centered industrial technologies. As this field of study began only recently, and the demands for it are specific, it is limited to only the semiconductor industries, making it a unique discipline that is difficult to study if one does not know the market demand from companies. Professor Park became a leader after founding facilities and equipment for semiconductor cleaning and CMP studies. Hanyang University is evaluated as the only university that has been studying semiconductor cleaning for more than 30years, thanks to his research capability. As the transistor feature size of semiconductors has decreased to less than 10 nm, and the materials and structures of the transistor have changed dramatically, the importance of cleaning and CMP technologies has become unimaginably important. His research on EUV cleaning is also ongoing as it has become an important technology recentl. The result of its importance is in large part due to Professor Park’s hard work, securing research facilities, and the supply of manpower that made Hanyang University stand at the center of this research.

More than 70% of the research projects and fundings from Professor Park’s research lab are from industries including Samsung and SKhynix. Among them, approximately 30% of the project is from oversea major semconudctor industries. Understanding the needs of companies and producing research results in a given time frame are the lab’s strengths. Furthermore, it now provides a student internship program after making a strategic  relationship with a Japanese CMP tool company. His recent paper and patent work on cleaning technology after CMP process gained a significant amount of interest from domestic and global companies. Many companies are requesting a lot of continuous industry-university cooperation with deep interest in the research content from Professor Park’s lab based on published results.. Technology transfers of his research, patents, and the industrial impact of his papers are expected to increase continuously.

Professor Park created the first industry oriented research conference for the semiconductor industry. This was made possible because of his pioneering spirit and leadership in the domestic CMP and cleaning fields. He created the Korea CMPUGM with researchers from  major semiconductor companies 20 years ago and turned it into the world’s best professional organization in the field of CMP. In addition, creating the ICPT (International Conference on Planarization/CMP Technology) and developing it into a best-known and only international conference in CMP field is another achievement obtained by Professor Park.

Semiconductor cleaning began in the mid-1980s when the technological foundation was weak. There were few difficulties in cleaning technologies in the early phases when contaminants were in micron size. However, the importance of cleaning was emphasized when it became important to removee particles under 100nm, and its importance is being highlighted again due to the demand for technology that can clean particles under 10nm. Cleaning technology comes as a last technolgy in semiconductor process development and directly related to the device yield which affects the profit of semiconductor companies in a significant way.  He founded Industry Collaboration Center for Cleaning Technology(ICC-CT) at Hanyang University to educate process engineers and reserachers from industry and  conduct research, and consultations. Professor Park is leading the technology independence project of the Hanyang University Technology Independence Team against Japan’s trade regulation by presiding over the Industry-University Cooperation Committee. 

Professor Park is also conducting a global talent cultivation project between Korea and Belgium. Through an MOU with IMEC, the best research institute in the semiconductor field, and KU Leuven, a prestigious university, they will send both master’s and doctoral level students. Students sent to IMEC will work at the world’s best research institute, and its educational impact is impossible to be quantified in monetary terms. The technological difficulties in semiconductor cleaning and CMP are increasing and expanding. Optimum research results can only be obtained when joint research is conducted with professionals from different fields, as it needs an interdisciplinary understanding and interpretation. Professor Park is open to  anyone to contact him whenever they need his help. He has been trying to define the very definition of personal happiness since entering his 50s. He wishes to be a researcher who is helpful to the world while also trying to live a happy life, for only through true happiness can an individual feel any sense of achievement in their research and educational endeavors.

 
2015 ~ present    Member, The National Academy of Engineering of Korea (NAEK)

2017 ~ present  Director, Environmentally Benign Surface Cleaning ICC

2012 ~ 2014    Vice Dean of Graduate School

2012 ~ 2019    President, Society of International Planrarization/CMP Technology

2009 ~ 2012    Visiting Research Professor, Northeastern University, Boston, MA

2006 ~ present    Managing Director and Board Member of Korea Cleaning UGM

2004 ~ 2006 and 2011 ~ 2015    President of Korea CMPUGM

2003 ~ present    Program Committee Member, SEMI Korea STS

2002 ~ 2003 Visiting Scholar, Department of Mechanical Industrial and Manufacturing Engineering, Northeastern University, Boston,USA

1992 ~ 1994 Member Technical Staff, Texas Instruments, Dallas, TX, USA

- Wet Cleaning Processes/Chemicals in Semiconductor and Electronic Materials Fabrication
- Chemical Mechanical Planrization, Post CMP Cleaning
- Mask and EUV Cleaning
- Wettability of Surfaces
- Particle/Metallic Adhesion and Removal

“Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning”, Polymer Testing, 2019 Find more
“Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications”, ECS J. Solid State Sci. Technol., 2019 Find more
“Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents”, Colloids and Surfaces A, 2018 Find more
“Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process”, Applied Surface Science, 2016 Find more
“Fabrication of hydrophobic/hydrophilic switchable aluminum surfaceusing poly(N-isopropylacrylamide)”, Progress in Organic Coatings, 2016 Find more

Develoments in surface contamination and cleaning, Volume 9: Methods for Surface Cleaning (2017) ISBN: 978-0-3234-3157-6, Chapter 5. Contamination Removal From UV and EUV Photomasks, 2017 Find more
Handbook of Silicon Wafer Cleaning Technolgy, 3rd Ed., ISBN: 978-0-323-51084-4, Chapter 3. Particle Deposition and Adhesion and Chapter 10. Metal Surface Chemical Composition and Morphology, 2018 Find more
Guest Editor, Focus Issue on Chemical Mechanical  Planarization for Sub-10 nm Technologies, ECS Journal of Solid State Science and Technology, 2019 Find more

Ebara (Japan), Post CMP Cleaning
Samsung Electronics (Korea), Backside particles contamination
BASF-Chemetall (USA), Ceria particle removal 
SKhynix (Korea), IPA impurity control

EUV mask cleansing solution and method of fabrication of the same Find more
Cleaning method for PVA brush and that apparatus thereof Find more
 
 

  Go! Hanyang WIKI : http://wiki.hanyang.ac.kr/Jin-Goo_Park

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